Silicon monocrystal and other semiconductors' polishing

A semiconductor is a material which has electrical conductivity to a degree between that of a metal and that of an insulator. The basic materials used in semiconductor and power electronics are silicon and to a much lesser extent germanium. Silicon possesses a unique set of important for electronics physical and chemical properties being stable over time in a broad temperature range. Silicon has a wide forbidden band which is favourable for many circuits and devices (1,1 eV), it absorbs optical radiation in the range including the spectrum of sensitivity of the human eye, thus providing a function in technical devices, being similar to a visual one. In addition, on the silicon wafer surface it is easy to obtain an oxide film. Such a film acts as an insulator, the presence of which is obligatory for any semiconductor device. Germanium has lower specifications than that of silicon and is mainly used as isovalent impurities in silicon, thus complicating the decomposition of a solid oxygen solution in silicon.

Performance of silicon electrolyte-plasma treatment and polishing:

Recommended processing time for silicon polishing — 180 sec.

Grinding and deburring speed ​​ — 40 sec.

Average time to reduce the roughness value by 1 class — 75 sec.

The number of polishing cycles before changing the electrolyte — 80.

Find out the cost of silicon processing